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Influence of oxygen flow rate on photocatalytic TiO
2
films deposited by rf magnetron sputtering
A. H. Chiou,
C. G. Kuo
, C. H. Huang, W. F. Wu, C. P. Chou, C. Y. Hsu
工業教育學系
研究成果
:
雜誌貢獻
›
文章
›
同行評審
6
引文 斯高帕斯(Scopus)
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Chemical Compounds
Magnetron sputtering
Methylene Blue
Hydrophilicity
Thin films
titanium dioxide
Partial pressure
Flow rate
Decomposition
Oxygen
Photocatalytic activity
Lighting
Substrates
Ultraviolet radiation
Crystal structure
Surface morphology
Contact angle
Irradiation
Gases
Glass
Water
Temperature
Engineering & Materials Science
Magnetron sputtering
Hydrophilicity
Thin films
Titanium dioxide
Oxygen
Partial pressure
Flow rate
Decomposition
Photocatalytic activity
Lighting
Substrates
Ultraviolet radiation
Crystal structure
Surface morphology
Contact angle
Irradiation
Glass
Gases
Water
Temperature
Physics & Astronomy
methylene blue
magnetron sputtering
flow velocity
decomposition
partial pressure
oxygen
thin films
illumination
anatase
titanium oxides
gas pressure
crystal structure
ceramics
irradiation
glass
water
temperature