Influence of oxygen flow rate on photocatalytic TiO 2 films deposited by rf magnetron sputtering

A. H. Chiou, C. G. Kuo, C. H. Huang, W. F. Wu, C. P. Chou, C. Y. Hsu*

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

6 引文 斯高帕斯(Scopus)

摘要

Titanium dioxide (TiO 2) thin films having anatase (1 0 1) crystal structure were prepared on non-alkali glass substrates by rf (13.56 MHz) magnetron sputtering using a TiO 2 ceramic target under various oxygen partial pressures. At a fixed substrate temperature of 400 °C and total gas pressure of 1 Pa after 3 h deposition. Effects of oxygen partial pressure on the structural, surface morphology, and photocatalytic activities of the TiO 2 thin films were investigated. We performed both photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity under UV light illumination. The XRD patterns exhibited a broad-hump shape indicating the amorphous structure of TiO 2 thin films. The results showed that when the [O 2/(Ar + O 2)] flow rate increased to 50%, the photoinduced decomposition of MB and photoinduced hydrophilicity were enhanced. The water contact angle after 9 min UV illumination was approximately 4.5°, and the methylene blue (MB) solution decomposition from 12 down to 3.34 μ mol/L for 240 min UV irradiation.

原文英語
頁(從 - 到)589-594
頁數6
期刊Journal of Materials Science: Materials in Electronics
23
發行號2
DOIs
出版狀態已發佈 - 2012 二月 1

ASJC Scopus subject areas

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 凝聚態物理學
  • 電氣與電子工程

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