Improving ESD Robustness of pMOS Device With Embedded SCR in 28-nm High-k/Metal Gate CMOS Process

Chun Yu Lin, Pin Hsin Chang, Rong Kun Chang

研究成果: 雜誌貢獻期刊論文同行評審

10 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds