Improvement on properties and reliability of ultra-thin silicon oxide (3-5 nm) grown by microwave plasma afterglow at the low temperatures using mixtures of N2O and O2

C. W. Leu*, Shu-Fen Hu, P. C. Chen, H. L. Hwang

*此作品的通信作者

研究成果: 雜誌貢獻會議論文同行評審

1 引文 斯高帕斯(Scopus)

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Chemical Compounds

Physics & Astronomy

Engineering & Materials Science