Improvement on properties and reliability of ultra-thin silicon oxide (3-5 nm) grown by microwave plasma afterglow at the low temperatures using mixtures of N2O and O2

C. W. Leu*, S. F. Hu, P. C. Chen, H. L. Hwang

*此作品的通信作者

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1 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy