The capping metal plays an important role on HfZrO2 (HZO) crystallization for ferroelectric phase. The Mo top electrode MIM capacitor is demonstrated with high remnant polarization and endurance as compared with TaN electrode. The optimized data retention for 500°C annealing device presents (>30) μC/cm2 up to 2×104 sec and slightly degradation extrapolated to 3×108 sec (10 years). The Mo electrode exhibits higher 2Pr and excellent endurance performance ((>10)5 cycles) as compared with that of TaN electrode. It is beneficial for promising ultra-thin FE-HZO as the guidelines for low-power CMOS/memory applications.