Improvement of ferroelectric properties in undoped hafnium oxide thin films using thermal atomic layer deposition

Jun Dao Luo, He Xin Zhang, Zheng Ying Wang, Siang Sheng Gu, Yun Tien Yeh, Hao Tung Chung, Kai Chi Chuang, Chan Yu Liao, Wei Shuo Li, Yi Shao Li, Kai Shin Li, Min Hung Lee, Huang Chung Cheng