Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode

Chun Hu Cheng; Kuo Cheng Chiang; Han Chang Pan; Chien Nan Hsiao; Chang Pin Chou; Sean P. Mcalister; Albert Chin

doi:10.1143/JJAP.46.7300

Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode

Chun Hu Cheng^*, Kuo Cheng Chiang, Han Chang Pan, Chien Nan Hsiao, Chang Pin Chou, Sean P. Mcalister, Albert Chin

^*此作品的通信作者

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

16 引文斯高帕斯（Scopus）

摘要

We have studied the reliability of high-κ (κ ∼ 49) Ti _xHf_1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

原文	英語
頁（從 - 到）	7300-7302
頁數	3
期刊	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
卷	46
發行號	11
DOIs	https://doi.org/10.1143/JJAP.46.7300
出版狀態	已發佈 - 2007 11月 6
對外發佈	是

ASJC Scopus subject areas

一般工程
一般物理與天文學

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10.1143/JJAP.46.7300

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Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode. / Cheng, Chun Hu; Chiang, Kuo Cheng; Pan, Han Chang 等.
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 卷 46, 編號 11, 06.11.2007, p. 7300-7302.

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

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abstract = "We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.",

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author = "Cheng, {Chun Hu} and Chiang, {Kuo Cheng} and Pan, {Han Chang} and Hsiao, {Chien Nan} and Chou, {Chang Pin} and Mcalister, {Sean P.} and Albert Chin",

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AU - Chou, Chang Pin

AU - Mcalister, Sean P.

AU - Chin, Albert

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N2 - We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

AB - We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

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Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode

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