Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode

Chun Hu Cheng*, Kuo Cheng Chiang, Han Chang Pan, Chien Nan Hsiao, Chang Pin Chou, Sean P. Mcalister, Albert Chin

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

16 引文 斯高帕斯(Scopus)

摘要

We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

原文英語
頁(從 - 到)7300-7302
頁數3
期刊Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
46
發行號11
DOIs
出版狀態已發佈 - 2007 十一月 6

ASJC Scopus subject areas

  • 工程 (全部)
  • 物理與天文學 (全部)

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