Improved lower electrode oxidation of high-k TiCeO metal-insulator-metal capacitors by using a novel plasma treatment

C. H. Cheng, H. H. Hsu, C. K. Deng, Albert Chin, C. P. Chou

研究成果: 書貢獻/報告類型會議論文篇章

指紋 深入研究「Improved lower electrode oxidation of high-k TiCeO metal-insulator-metal capacitors by using a novel plasma treatment」主題。共同形成了獨特的指紋。

Engineering & Materials Science