Impact of stress induced by stressors on hot carrier reliability of strained nMOSFETs

K. C. Lin, M. J. Twu*, P. C. Juan, H. W. Hsu, H. S. Huang, M. C. Wang, C. H. Liu

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

指紋

深入研究「Impact of stress induced by stressors on hot carrier reliability of strained nMOSFETs」主題。共同形成了獨特的指紋。

Material Science

Engineering

INIS