@inproceedings{e1464915527141799abf62064dcbb26f,
title = "Impact of ferroelectric domain switching in nonvolatile charge-trapping memory",
abstract = "In this work, we proposal a ferroelectric domain to enhance program/erase/read efficiency of conventional charge-trapping nonvolatile memory. The ferroelectric-domain-dominated HfZrO/HfON memory shows the better subthreshold characteristics than control charge-trapping structure (HfO2/HfON). Additionally, the memory speed with ferroelectric polarization (∼800ns) is more than three orders of magnitude faster than that of control trapping type.",
keywords = "Ferroelectric domain, HfZrO and HfON",
author = "Fan, {Chia Chi} and Chiu, {Yu Chien} and Chien Liu and Liou, {Guan Lin} and Lai, {Wen Wei} and Chen, {Yi Ru} and Cheng, {Chun Hu} and Chang, {Chun Yen}",
note = "Publisher Copyright: {\textcopyright} 2017 IEEE.; 2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017 ; Conference date: 28-02-2017 Through 02-03-2017",
year = "2017",
month = jun,
day = "13",
doi = "10.1109/EDTM.2017.7947573",
language = "English",
series = "2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017 - Proceedings",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "224--225",
booktitle = "2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017 - Proceedings",
}