Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

Tien Li Chang*, Kuei Yuan Cheng, Ta Hsin Chou, Chih Chieh Su, Han Ping Yang, Shao Wei Luo

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

27 引文 斯高帕斯(Scopus)

摘要

This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown

原文英語
頁(從 - 到)874-877
頁數4
期刊Microelectronic Engineering
86
發行號4-6
DOIs
出版狀態已發佈 - 2009 四月 1
對外發佈

ASJC Scopus subject areas

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 凝聚態物理學
  • 表面、塗料和薄膜
  • 電氣與電子工程

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