摘要
An AND-type split-gate Flash memory cell with a trench select gate and a buried n+ source is proposed. This cell, programmed by ballistic source side injection (BSSI), can provide high programming efficiency with a cell size of 5 F2. Furthermore, both the programming speed and the read current are enhanced by the shared select gate configuration.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 109-111 |
| 頁數 | 3 |
| 期刊 | IEEE Transactions on Electron Devices |
| 卷 | 53 |
| 發行號 | 1 |
| DOIs | |
| 出版狀態 | 已發佈 - 2006 1月 |
| 對外發佈 | 是 |
ASJC Scopus subject areas
- 電子、光磁材料
- 電氣與電子工程
指紋
深入研究「Highly scalable ballistic injection AND-type (BiAND) flash memory」主題。共同形成了獨特的指紋。引用此
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