High-k Metal-Insulator-Metal Capacitors for RF and Mixed-Signal VLSI Circuits: Challenges and Opportunities

D. Kannadassan*, K. Sivasankaran, S. Kumaravel, Chun Hu Cheng, Maryam Shojaei Baghini, P. S. Mallick

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

指紋

深入研究「High-k Metal-Insulator-Metal Capacitors for RF and Mixed-Signal VLSI Circuits: Challenges and Opportunities」主題。共同形成了獨特的指紋。

INIS

Material Science

Engineering