摘要
A study of laser processing of gallium nitride (GaN) material is reported. A pulsed KrF excimer laser at 248 nm with 20-nsec pulse width and 1 Hz repetition rate is used to etch the GaN film. We establish the material etching parameters under different environmental conditions. By changing the pulsed energy at constant pulse numbers, ablation of GaN surface was observed at threshold laser fluence about 0.3 J cm-2. Laser etching increase with reducing environment pressure. At 1.0 J cm-2 laser fluence, the etching rate is about 35 nm per pulse at atmosphere pressure and increases to 60 nm per pulse at low pressure. The etched depth also increases with increasing laser fluence. The surface morphology of the etched surface was also investigated.
原文 | 英語 |
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頁(從 - 到) | 42-44 |
頁數 | 3 |
期刊 | Materials Science and Engineering B: Solid-State Materials for Advanced Technology |
卷 | 82 |
發行號 | 1-3 |
DOIs | |
出版狀態 | 已發佈 - 2001 5月 22 |
對外發佈 | 是 |
ASJC Scopus subject areas
- 材料科學(全部)
- 凝聚態物理學
- 材料力學
- 機械工業