摘要
In this paper, we numerically study an enhancement of breakdown voltage in AlGaN/GaN high-electron-mobility transistors (HEMTs) by using the AlGaN/GaN/AlGaN quantum-well (QW) electron-blocking layer (EBL) structure. This concept is based on the superior confinement of two-dimensional electron gases (2-DEGs) provided by the QW EBL, resulting in a significant improvement of breakdown voltage and a remarkable suppression of spilling electrons. The electron mobility of 2-DEG is hence enhanced as well. The dependence of thickness and composition of QW EBL on the device breakdown is also evaluated and discussed.
| 原文 | 英語 |
|---|---|
| 文章編號 | 433 |
| 頁(從 - 到) | 1-9 |
| 頁數 | 9 |
| 期刊 | Nanoscale Research Letters |
| 卷 | 9 |
| 發行號 | 1 |
| DOIs | |
| 出版狀態 | 已發佈 - 2014 |
ASJC Scopus subject areas
- 一般材料科學
- 凝聚態物理學
指紋
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