Hetero-tunnel field-effect-transistors with epitaxially grown germanium on silicon

Min Hung Lee, Jhe Cyun Lin, Cheng Ying Kao

    研究成果: 雜誌貢獻期刊論文同行評審

    14 引文 斯高帕斯(Scopus)

    摘要

    The epitaxially grown Ge (epi-Ge)/Si hetero-tunnel field-effect transistors (HTFETs) is demonstrated to enhance band-to-band tunneling (BTBT) current because of effective bandgap reduction. The epi-Ge HTFET has a drain current as high as 11 μAμm at V GS= V DS=-2 V, which enhances 2.3× as compared with that of Si, and the drain-induced barrier thinning (DIBT) shows 28 mV/V. The smaller subthreshold swing of epi-Ge HTFET is obtained as compared with Si. The current mechanism of BTBT is confirmed at the interface of epi-Ge/Si hetero-tunneling occurring in the n+-region by hole barrier height extraction. The gate/source overlap lengths for parallel-plate tunneling region are discussed for current and DIBT.

    原文英語
    文章編號6527300
    頁(從 - 到)2423-2427
    頁數5
    期刊IEEE Transactions on Electron Devices
    60
    發行號7
    DOIs
    出版狀態已發佈 - 2013 七月 15

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Electrical and Electronic Engineering

    指紋 深入研究「Hetero-tunnel field-effect-transistors with epitaxially grown germanium on silicon」主題。共同形成了獨特的指紋。

    引用此