Growth of si3 n4 thin films on si(111) surface by rf-n2 plasma nitriding

Wei Chun Chen*, Sheng Chen, Tung Yuan Yu, James Su, Hung Pin Chen, Yu Wei Lin, Chin Pao Cheng

*此作品的通信作者

研究成果: 雜誌貢獻通訊期刊論文同行評審

1 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy