Growth of ferromagnetic Nd0.7Sr0.3MnO3 films with an off-axis sputtering configuration

L. M. Wang; H. H. Sung; B. T. Su; H. C. Yang; H. E. Horng

doi:10.1063/1.1289075

Growth of ferromagnetic Nd_0.7Sr_0.3MnO₃ films with an off-axis sputtering configuration

L. M. Wang^*, H. H. Sung, B. T. Su, H. C. Yang, H. E. Horng

^*此作品的通信作者

光電工程學士學位學程

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

19 引文斯高帕斯（Scopus）

摘要

Ferromagnetic Nd_0.7Sr_0.3MnO₃ (NSMO) films have been prepared onto (001) SrTiO₃ by the off-axis magnetron sputtering technique. The NSMO films are characterized by resistivity measurements, x-ray diffraction, and the atomic force microscope. Under our deposition conditions the films show a maximum resistivity (ρ_max) at the highest peak temperature of Tp=180-240 K. By increasing the deposition temperature, T_p shifts to lower temperature and ρ_max increases. In an applied magnetic field, large magnetoresistance (MR) ratios >2200% for several in situ deposited films at 180 K and H = 6 T are obtained. The influence of growth conditions on the magnetotransport properties of NSMO films and their MR characteristics are discussed.

原文	英語
頁（從 - 到）	4236-4240
頁數	5
期刊	Journal of Applied Physics
卷	88
發行號	7
DOIs	https://doi.org/10.1063/1.1289075
出版狀態	已發佈 - 2000 十月

ASJC Scopus subject areas

物理與天文學 (全部)

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10.1063/1.1289075

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title = "Growth of ferromagnetic Nd0.7Sr0.3MnO3 films with an off-axis sputtering configuration",

abstract = "Ferromagnetic Nd0.7Sr0.3MnO3 (NSMO) films have been prepared onto (001) SrTiO3 by the off-axis magnetron sputtering technique. The NSMO films are characterized by resistivity measurements, x-ray diffraction, and the atomic force microscope. Under our deposition conditions the films show a maximum resistivity (ρmax) at the highest peak temperature of Tp=180-240 K. By increasing the deposition temperature, Tp shifts to lower temperature and ρmax increases. In an applied magnetic field, large magnetoresistance (MR) ratios >2200% for several in situ deposited films at 180 K and H = 6 T are obtained. The influence of growth conditions on the magnetotransport properties of NSMO films and their MR characteristics are discussed.",

author = "Wang, {L. M.} and Sung, {H. H.} and Su, {B. T.} and Yang, {H. C.} and Horng, {H. E.}",

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T1 - Growth of ferromagnetic Nd0.7Sr0.3MnO3 films with an off-axis sputtering configuration

AU - Wang, L. M.

AU - Sung, H. H.

AU - Su, B. T.

AU - Yang, H. C.

AU - Horng, H. E.

PY - 2000/10

Y1 - 2000/10

N2 - Ferromagnetic Nd0.7Sr0.3MnO3 (NSMO) films have been prepared onto (001) SrTiO3 by the off-axis magnetron sputtering technique. The NSMO films are characterized by resistivity measurements, x-ray diffraction, and the atomic force microscope. Under our deposition conditions the films show a maximum resistivity (ρmax) at the highest peak temperature of Tp=180-240 K. By increasing the deposition temperature, Tp shifts to lower temperature and ρmax increases. In an applied magnetic field, large magnetoresistance (MR) ratios >2200% for several in situ deposited films at 180 K and H = 6 T are obtained. The influence of growth conditions on the magnetotransport properties of NSMO films and their MR characteristics are discussed.

AB - Ferromagnetic Nd0.7Sr0.3MnO3 (NSMO) films have been prepared onto (001) SrTiO3 by the off-axis magnetron sputtering technique. The NSMO films are characterized by resistivity measurements, x-ray diffraction, and the atomic force microscope. Under our deposition conditions the films show a maximum resistivity (ρmax) at the highest peak temperature of Tp=180-240 K. By increasing the deposition temperature, Tp shifts to lower temperature and ρmax increases. In an applied magnetic field, large magnetoresistance (MR) ratios >2200% for several in situ deposited films at 180 K and H = 6 T are obtained. The influence of growth conditions on the magnetotransport properties of NSMO films and their MR characteristics are discussed.

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Growth of ferromagnetic Nd0.7Sr0.3MnO3 films with an off-axis sputtering configuration

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Growth of ferromagnetic Nd_0.7Sr_0.3MnO₃ films with an off-axis sputtering configuration