INIS
films
100%
growth
100%
substrates
100%
gallium nitrides
100%
doped materials
100%
silicon carbides
100%
molecular beam epitaxy
100%
zinc sulfides
100%
concentration
50%
mobility
50%
levels
25%
range
25%
effusion
25%
temperature range 0273-0400 k
25%
free radicals
25%
plasma
25%
nitrogen
25%
impurities
25%
carriers
25%
Physics
Substrates
100%
Growth
100%
Zinc Sulfide
100%
Molecular Beam Epitaxy
100%
Conduction Band
100%
Temperature
66%
Room Temperature
33%
High Temperature
33%
Nitrogen
33%
Impurities
33%
Adjusting
33%
Plasma Jet
33%
Free Radicals
33%
Material Science
Temperature
100%
Molecular Beam Epitaxy
100%
Characterization
100%
Zinc
100%
Material
25%
Electrical Property
25%
Carrier Concentration
25%
Impurity
25%
Epilayers
25%