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Gate-to-source ESD protection design for GaN-on-silicon power HEMT

  • Chieh Chen Ker
  • , Chun Yu Lin
  • , Ming Duo Ker*
  • , Yu Hsuan Chang
  • , Ching Wei Li
  • , Tsung Yin Chiang
  • , Chun Chi Wang
  • *此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

2   連結會在新分頁中打開 引文 斯高帕斯(Scopus)

摘要

A monolithic integrated bidirectional gate-to-source ESD protection circuit for power high-electron-mobility transistor (HEMT) in GaN-on-Si process is proposed. The proposed circuit is incorporated with a voltage detection mechanism to ensure that the ESD protection circuit is selectively activated only under ESD stress conditions, thereby minimizing the unwanted interference and standby leakage current during normal device operation. It has been demonstrated that the proposed design can significantly enhance the robustness against ESD events with human-body-model (HBM) ESD level exceeding ±8 kV and IEC ESD level beyond ±2.5 kV.

原文英語
文章編號115948
期刊Microelectronics Reliability
175
DOIs
出版狀態已發佈 - 2025 12月
對外發佈

ASJC Scopus subject areas

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 安全、風險、可靠性和品質
  • 凝聚態物理學
  • 表面、塗料和薄膜
  • 電氣與電子工程

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