摘要
A monolithic integrated bidirectional gate-to-source ESD protection circuit for power high-electron-mobility transistor (HEMT) in GaN-on-Si process is proposed. The proposed circuit is incorporated with a voltage detection mechanism to ensure that the ESD protection circuit is selectively activated only under ESD stress conditions, thereby minimizing the unwanted interference and standby leakage current during normal device operation. It has been demonstrated that the proposed design can significantly enhance the robustness against ESD events with human-body-model (HBM) ESD level exceeding ±8 kV and IEC ESD level beyond ±2.5 kV.
| 原文 | 英語 |
|---|---|
| 文章編號 | 115948 |
| 期刊 | Microelectronics Reliability |
| 卷 | 175 |
| DOIs | |
| 出版狀態 | 已發佈 - 2025 12月 |
| 對外發佈 | 是 |
ASJC Scopus subject areas
- 電子、光磁材料
- 原子與分子物理與光學
- 安全、風險、可靠性和品質
- 凝聚態物理學
- 表面、塗料和薄膜
- 電氣與電子工程
指紋
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