跳至主導覽 跳至搜尋 跳過主要內容

First-Principles DFT+U Study of Orthorhombic Rivalry in Ferroelectric Hafnia-Zirconia

研究成果: 書貢獻/報告類型 › 會議論文篇章

摘要

Ferroelectric Hf1-xZrxO2 (HZO) is a leading candidate for silicon-technology-compatible non-volatile memory, yet the microscopic origin of its polarization remains under debate due to the near-degeneracy of polar orthorhombic phases. Here, we employ first-principles DFT+U calculations to systematically compare the structural, electronic, and ferroelectric properties of the Pca21 and Pmn21 polymorphs across a range of Hf/Zr stoichiometries. Equation-of-state analysis confirms mechanical stability for both phases, with Pmn21 exhibiting slightly larger lattice constants. Energetic trends reveal that phase stability is highly sensitive to Zr content, whereas the spontaneous polarization (∼56-60 μC cm-2) and wide band gap (∼6 eV) remain remarkably robust. This resilience originates from the fact that substitutional Zr modifies orbital hybridization but preserves the underlying O-2p to Hf/Zr-d charge-transfer mechanism in both polymorphs. These findings show that stoichiometry dictates phase stability, while ferroelectric functionality remains robust against cation ratio and polymorphic competition, offering symmetry- and orbital-guided principles for designing hafnia-zirconia in future memory and logic devices.

原文英語
主出版物標題10th IEEE Electron Devices Technology and Manufacturing Conference
主出版物子標題Emerging Semiconductor Devices and Manufacturing Technologies, EDTM 2026
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9798331585983
DOIs
出版狀態已發佈 - 2026
對外發佈是
事件10th IEEE Electron Devices Technology and Manufacturing Conference: Emerging Semiconductor Devices and Manufacturing Technologies, EDTM 2026 - Penang, 马来西亚
持續時間: 2026 3月 1 → 2026 3月 4

出版系列

名字10th IEEE Electron Devices Technology and Manufacturing Conference: Emerging Semiconductor Devices and Manufacturing Technologies, EDTM 2026

會議

會議10th IEEE Electron Devices Technology and Manufacturing Conference: Emerging Semiconductor Devices and Manufacturing Technologies, EDTM 2026
國家/地區马来西亚
城市Penang
期間2026/03/01 → 2026/03/04

ASJC Scopus subject areas

  • 能源工程與電力技術
  • 電氣與電子工程
  • 電子、光磁材料
  • 儀器

指紋

深入研究「First-Principles DFT+U Study of Orthorhombic Rivalry in Ferroelectric Hafnia-Zirconia」主題。共同形成了獨特的指紋。

引用此