摘要
Atomic layer deposition (ALD)-based TiN electrode on ferroelectric HfZrO2 metal/ferroelectric/metal (MFM) capacitor and ferroelectric field-effect transistor (FeFET) is demonstrated experimentally with weight transfer, that is, $\Delta {P}$ , per pulse analysis through consecutive alternating potentiation/depression (Pot./Dep.) training pulses. The weight training pulse schemes are studied to have symmetric and linear synapse weight transfer to increase the accuracy and accelerate the deep neural network (DNN) training. With ALD TiN inserted, $\alpha _{p} / \alpha _{d} = -0.63$ / -0.84, asymmetry $\vert \alpha _{p} - \alpha _{d}\vert =0.21$ , and polarization modulation ratio (Pot./Dep.) = 97%/98% are achieved for MFM capacitor, and $\alpha _{p} / \alpha _{d} = -1.32$ / -1.88, asymmetry $\vert \alpha _{p} - \alpha _{d}\vert =0.56$ , and $G_{\text {max}} / G_{\text {min}} > 10\times $ are delivered for FeFET.
| 原文 | 英語 |
|---|---|
| 文章編號 | 9180313 |
| 頁(從 - 到) | 4201-4207 |
| 頁數 | 7 |
| 期刊 | IEEE Transactions on Electron Devices |
| 卷 | 67 |
| 發行號 | 10 |
| DOIs | |
| 出版狀態 | 已發佈 - 2020 10月 |
ASJC Scopus subject areas
- 電子、光磁材料
- 電氣與電子工程
指紋
深入研究「Ferroelectric HfZrO2with Electrode Engineering and Stimulation Schemes as Symmetric Analog Synaptic Weight Element for Deep Neural Network Training」主題。共同形成了獨特的指紋。引用此
- APA
- Standard
- Harvard
- Vancouver
- Author
- BIBTEX
- RIS