跳至主導覽 跳至搜尋 跳過主要內容

Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on

  • M. H. Lee*
  • , Y. T. Wei
  • , J. C. Lin
  • , C. W. Chen
  • , W. H. Tu
  • , M. Tang
  • *此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

59   連結會在新分頁中打開 引文 斯高帕斯(Scopus)

摘要

Using a ferroelectric PbZrTiO3 gate stack, the range of the steep subthreshold swing in tunnel field-effect transistors was extended by 3.5 orders of magnitude demonstrating an improvement in the swing (by approximately double the slope). The drain conductance (gd) shows only 16% enhancement with large V DS (∼- 1.5V) indicates internal voltage amplification with ferroelectric negative capacitance effect beneficial to small lateral drain-source bias voltages (-0.1 V). The concept of coupling the ferroelectric polarization is proposed. The power consumption is also discussed in low-power applications of steep subthreshold slope devices.

原文英語
文章編號107117
期刊AIP Advances
4
發行號10
DOIs
出版狀態已發佈 - 2014 10月 1

ASJC Scopus subject areas

  • 一般物理與天文學

指紋

深入研究「Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on」主題。共同形成了獨特的指紋。

引用此