Fabrication of silicon nanowire structures based on proximity effects of electron-beam lithography

S. F. Hu, W. C. Weng, Y. M. Wan

研究成果: 雜誌貢獻文章同行評審

13 引文 斯高帕斯(Scopus)

指紋 深入研究「Fabrication of silicon nanowire structures based on proximity effects of electron-beam lithography」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy