Fabrication of silicon nanowire structures based on proximity effects of electron-beam lithography

S. F. Hu*, W. C. Weng, Y. M. Wan

*此作品的通信作者

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

14 引文 斯高帕斯（Scopus）

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Earth and Planetary Sciences

Engineering

INIS

Material Science