Fabrication of glass micro-prisms using ultra-fast laser pulses with chemical etching process

In this study, a new process of glass micro-prism structures is investigated by an ultra-fast laser irradiation with chemical etching process. The ultra-fast laser is employed by an all-in-one femtosecond laser (FS-laser) system with the amplifier as an excitation source for patterning the structures. Here, the center wavelength of laser is frequency-doubled to 517 nm. Besides, the repetition rate and pulse width of laser are 100 kHz and 350 fs, respectively. First, the embedded gratings of glass with different pitches can be fabricated using a FS-laser process. Afterwards, the glass samples are placed in the hydrofluoric acid (HF) solution for 15 min to develop structures. Finally, the results of this study demonstrated that the V-cut micro-prisms are successfully formed by controlling etching concentration between intrinsic glass material and modified areas.