Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

Tien Li Chang; Shao Wei Luo; Han Ping Yang; Chi Hung Lee

doi:10.1016/j.mee.2009.12.037

Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

Tien Li Chang^*, Shao Wei Luo, Han Ping Yang, Chi Hung Lee

^*此作品的通信作者

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

23 引文斯高帕斯（Scopus）

摘要

This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure. Crown

原文	英語
頁（從 - 到）	1344-1347
頁數	4
期刊	Microelectronic Engineering
卷	87
發行號	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.12.037
出版狀態	已發佈 - 2010 5月
對外發佈	是

ASJC Scopus subject areas

電子、光磁材料
原子與分子物理與光學
凝聚態物理學
表面、塗料和薄膜
電氣與電子工程

存取文件

10.1016/j.mee.2009.12.037

其它文件與鏈接

引用此

@article{bb5082ca68c14aecbbb2526f232e2733,

title = "Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining",

abstract = "This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure. Crown",

keywords = "Diffraction grating, Femtosecond laser, Micromachining, PDMS",

author = "Chang, {Tien Li} and Luo, {Shao Wei} and Yang, {Han Ping} and Lee, {Chi Hung}",

year = "2010",

month = may,

doi = "10.1016/j.mee.2009.12.037",

language = "English",

volume = "87",

pages = "1344--1347",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier BV",

number = "5-8",

}

TY - JOUR

T1 - Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

AU - Chang, Tien Li

AU - Luo, Shao Wei

AU - Yang, Han Ping

AU - Lee, Chi Hung

PY - 2010/5

Y1 - 2010/5

N2 - This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure. Crown

AB - This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure. Crown

KW - Diffraction grating

KW - Femtosecond laser

KW - Micromachining

KW - PDMS

UR - http://www.scopus.com/inward/record.url?scp=76949084899&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=76949084899&partnerID=8YFLogxK

U2 - 10.1016/j.mee.2009.12.037

DO - 10.1016/j.mee.2009.12.037

M3 - Article

AN - SCOPUS:76949084899

SN - 0167-9317

VL - 87

SP - 1344

EP - 1347

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

ER -

Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

摘要

ASJC Scopus subject areas

存取文件

其它文件與鏈接

指紋

引用此