摘要
The study presents a combination of self-assembled nanosphere lithography (SANL) and photo-assisted electrochemical etching (PAECE) to cost-effectively form an arrayed nanostructure on the silicon wafer. The aspect ratio of the pores in this nanoarray fabricated through PAECE is around 22:1. Tuning the etching voltage can convert the nanopore array to a nanopillar array with an aspect ratio of about 20:1. Finally, a two-staged PAECE is used to produce a nanopillar arrays for the production of fuel cell electrodes. Its reaction current of 10.2 mA is 72.9 times higher than that obtained by a planar electrode.
原文 | 英語 |
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文章編號 | 045003 |
期刊 | Journal of Micromechanics and Microengineering |
卷 | 19 |
發行號 | 4 |
DOIs | |
出版狀態 | 已發佈 - 2009 |
ASJC Scopus subject areas
- 電子、光磁材料
- 材料力學
- 機械工業
- 電氣與電子工程