摘要
Using x-ray diffraction, cross-sectional transmission electron microscopy (XTEM), and infrared absorption techniques, we have investigated the effects of nanocrystallization on the structural and optical properties of GaAs0.99N0.01 grown by plasma-enhanced molecular-beam epitaxy. The x-ray diffraction results of postgrowth annealed samples with a protective Si3N4 cap exhibit significant lattice relaxation, structural inhomogeneity, and apparent nitrogen "loss," indicating the occurrence of phase separation after thermal treatment. High-resolution XTEM confirms the formation of N-enriched GaAsN nanocrystals embedded at the GaAsN/Si3N4 interface. Infrared absorption study demonstrates that the annealed sample has a strongly enhanced direct optical transition.
原文 | 英語 |
---|---|
文章編號 | 113312 |
頁(從 - 到) | 1133121-1133124 |
頁數 | 4 |
期刊 | Physical Review B - Condensed Matter and Materials Physics |
卷 | 64 |
發行號 | 11 |
DOIs | |
出版狀態 | 已發佈 - 2001 9月 15 |
ASJC Scopus subject areas
- 電子、光磁材料
- 凝聚態物理學