摘要
We report the energy band offsets at a GaiOjCGdjO^J-GaAs interface. The valence-band offset (AEy) is ~ 2.6 eV, measured by soft x-ray photoemission spectroscopy. Analysis of the current-voltage characteristics of a Pt-GajOjfGdiO-GaAs MOS (metal-oxide-semiconductor) structure, which are dominated by Fowler-Nordheim tunneling, reveals a conduction-band offset (AEc) ~ 1.4 eV at the Ga2O3(Gd2O3)-GaAs interface and an electron effective mass (m) - 0.29 me of the Ga2O3(Gd2Oj) film.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 131-135 |
| 頁數 | 5 |
| 期刊 | Materials Research Society Symposium - Proceedings |
| 卷 | 573 |
| DOIs | |
| 出版狀態 | 已發佈 - 1999 |
| 對外發佈 | 是 |
| 事件 | Proceedings of the 1999 MRS Spring Meeting - Symposium Z, 'Compound Semiconductor Surface Passivation and Novel Device Processing' - San Francisco, CA, 美国 持續時間: 1999 4月 5 → 1999 4月 7 |
ASJC Scopus subject areas
- 一般材料科學
- 凝聚態物理學
- 材料力學
- 機械工業
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