Electrochromic properties and Raman spectroscopy analysis of tungsten oxide thin film by RF sputter

Chin Pao Cheng, Shi Hong Lin

研究成果: 書貢獻/報告類型會議論文篇章

1 引文 斯高帕斯(Scopus)

摘要

This study utilizes tungsten oxide as the research subject and investigates changes between different argon/oxygen gas flow ratio and deposits on ITO substrates through RF reactively sputtering. Propylene carbonate (PC) is further mixed with LiClO 4 for the preparation of electrolyte. After packaged into components, electric voltage is applied to the films to generate reduction or oxidization, which can obtain different colored/bleached states. Lastly, Raman spectroscopy analysis is performed to get a greater understanding of electrochromic mechanisms. The results of the experiment discovered that as-deposited tungsten oxide thin film shows the formation of W +6 states, and the application of driving voltage causes the formation of W +6 states. At the same time, the thin film coloring effect appears. Increases in driving voltage cause the gradual conversion of W +6 states into W +6 states, which further leads to a more significant coloring effect. On the other hand, W-O-W deformed crystal lattice structures are also produced, which also affects the incidence of electrochromic property.

原文英語
主出版物標題Materials Processing Technology
頁面328-332
頁數5
DOIs
出版狀態已發佈 - 2012
事件2nd International Conference on Advances in Materials and Manufacturing, ICAMMP 2011 - Guilin, 中国
持續時間: 2011 十二月 162011 十二月 18

出版系列

名字Advanced Materials Research
418-420
ISSN(列印)1022-6680

其他

其他2nd International Conference on Advances in Materials and Manufacturing, ICAMMP 2011
國家中国
城市Guilin
期間2011/12/162011/12/18

ASJC Scopus subject areas

  • Engineering(all)

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