摘要
The electrical instability behaviors of amorphous indium-gallium-zinc oxide thin-film transistors with and without titanium sub-oxide passivation layer were investigated under light illumination in this study. For the unpassivated IGZO TFT device, in contrast with the dark case, a noticeable increase of the sub-threshold swing was observed when under the illumination environment, which can be attributed to the generation of ionized oxygen vacancies within the α-IGZO active layer by high energy photons. For the passivated TFT device, the much smaller SS of ~70 mV/dec and high device mobility of >100 cm2/Vs at a drive voltage of 3 V with negligible degradation under light illumination are achieved due to the passivation effect of n-type titanium sub-oxide semiconductor, which may create potential application for high-performance display.
原文 | 英語 |
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文章編號 | 188 |
期刊 | Applied Physics A: Materials Science and Processing |
卷 | 123 |
發行號 | 3 |
DOIs | |
出版狀態 | 已發佈 - 2017 3月 1 |
ASJC Scopus subject areas
- 一般化學
- 一般材料科學