Electrical characterization and dielectric properties of metal-oxide-semiconductor structures using high-K CeZrO4 ternary oxide as gate dielectric
Pi Chun Juan*, Chuan Hsi Liu, Cheng Li Lin, Shin Chun Ju, Main Gwo Chen, Ingram Yin Ku Chanf, Jong Hong Lu
*此作品的通信作者
研究成果: 雜誌貢獻 › 期刊論文 › 同行評審
16
引文
斯高帕斯(Scopus)