Electrical characterization and dielectric properties of metal-oxide-semiconductor structures using high-K CeZrO4 ternary oxide as gate dielectric

Pi Chun Juan*, Chuan Hsi Liu, Cheng Li Lin, Shin Chun Ju, Main Gwo Chen, Ingram Yin Ku Chanf, Jong Hong Lu

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

16 引文 斯高帕斯(Scopus)

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Material Science

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Physics