Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography

T. L. Chang, F. Y. Chang, H. Y. Lin, W. L. Lai, J. H. Tsai, S. H. Chang

研究成果: 書貢獻/報告類型會議貢獻

摘要

A study of a top-down technique of nanoimprint lithography (NIL) for developing a novel bottom-up approach of chemical vapor deposition to generate anti-adhesive coatings between Ni mold stamps and polymethyl methacrylate (PMMA ) substrate is presented in this work. A polybenzoxazine ((6,6'- bis(2,3-dihydro-3-methyl-4H-1,3-benzoxazinyl))) molecule selfassembled monolayer (PBO-SAM) regarded as an anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can improve the nanoimprint process in Ni/PMMA substrates. In this experiment, the nanostructure-based Ni stamps and imprinted PMMA molds are fabricated using an electronbeam lithograph (EBL) and a homemade nanoimprint equipment, respectively. The diameter of pillar patterns obtained is 200 nm with 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this forming condition, the results of Ni mold stamps indicate over 90% improvement in controlling quality and quantity.

原文英語
主出版物標題Proceedings of the 35th International MATADOR 2007 Conference
頁面341-344
頁數4
出版狀態已發佈 - 2007 十二月 1
對外發佈Yes
事件35th International MATADOR 2007 Conference - Taipei, 臺灣
持續時間: 2007 七月 12007 七月 1

出版系列

名字Proceedings of the 35th International MATADOR 2007 Conference

其他

其他35th International MATADOR 2007 Conference
國家臺灣
城市Taipei
期間07/7/107/7/1

ASJC Scopus subject areas

  • Mechanics of Materials

指紋 深入研究「Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography」主題。共同形成了獨特的指紋。

引用此