Effects of mechanical agitation and surfactant additive on silicon anisotropic etching in alkaline KOH solution

Chii Rong Yang*, Po Ying Chen, Yuang Cherng Chiou, Rong Tsong Lee

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

95 引文 斯高帕斯(Scopus)

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INIS

Material Science

Chemical Engineering

Engineering