摘要
When an adatom encounters a lattice step, it can either be reflected or not reflected regardless of whether the step is a 'descending' or an 'ascending' step. These two types of steps are remarkably similar. In addition, lattice steps can act as atom-trap boundaries for diffusing atoms. Our FIM studies are briefly summarized. Based on our experimental data, we explain in simple terms that the 'high temperature' behavior of surface atoms and growth structures in thin film epitaxy are determined by the atom trapping property of the steps, whereas the 'low temperature' behavior and growth structures are determined by the reflection property of the steps.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 34-43 |
| 頁數 | 10 |
| 期刊 | Applied Surface Science |
| 卷 | 121-122 |
| DOIs | |
| 出版狀態 | 已發佈 - 1997 11月 |
ASJC Scopus subject areas
- 一般化學
- 凝聚態物理學
- 一般物理與天文學
- 表面和介面
- 表面、塗料和薄膜
指紋
深入研究「Effects of lattice steps on atom dynamics, surface diffusion and epitaxial growth」主題。共同形成了獨特的指紋。引用此
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