TY - JOUR
T1 - Effects of lattice steps in surface diffusion and epitaxial growth
AU - Tsong, Tien T.
AU - Fu, Tsu Yi
AU - Chen, Chonglin
PY - 1997/4
Y1 - 1997/4
N2 - The lattice step is an integral part of a surface. We report a study of the behavior of atoms at and near lattice steps since this behavior plays an important role in epitaxial growth and in affecting the structure of the thin films, particularly grown from the vapor phase, and also the dynamic behavior of the surface at elevated temperature. We use Ir surfaces as our model system, and study self-diffusion on the terrace as well as along the step edges of the (001) and (111) surfaces using the field ion microscope. We also study the descending and ascending motion of diffusion atoms at lattice steps and the upward movement of in-layer atoms to the upper terrace.
AB - The lattice step is an integral part of a surface. We report a study of the behavior of atoms at and near lattice steps since this behavior plays an important role in epitaxial growth and in affecting the structure of the thin films, particularly grown from the vapor phase, and also the dynamic behavior of the surface at elevated temperature. We use Ir surfaces as our model system, and study self-diffusion on the terrace as well as along the step edges of the (001) and (111) surfaces using the field ion microscope. We also study the descending and ascending motion of diffusion atoms at lattice steps and the upward movement of in-layer atoms to the upper terrace.
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U2 - 10.1016/S0169-4332(96)00774-X
DO - 10.1016/S0169-4332(96)00774-X
M3 - Article
AN - SCOPUS:0031547193
SN - 0169-4332
VL - 113-114
SP - 18
EP - 22
JO - Applied Surface Science
JF - Applied Surface Science
ER -