Effects of lattice steps in surface diffusion and epitaxial growth

Tien T. Tsong*, Tsu Yi Fu, Chonglin Chen


研究成果: 雜誌貢獻期刊論文同行評審

2 引文 斯高帕斯(Scopus)


The lattice step is an integral part of a surface. We report a study of the behavior of atoms at and near lattice steps since this behavior plays an important role in epitaxial growth and in affecting the structure of the thin films, particularly grown from the vapor phase, and also the dynamic behavior of the surface at elevated temperature. We use Ir surfaces as our model system, and study self-diffusion on the terrace as well as along the step edges of the (001) and (111) surfaces using the field ion microscope. We also study the descending and ascending motion of diffusion atoms at lattice steps and the upward movement of in-layer atoms to the upper terrace.

頁(從 - 到)18-22
期刊Applied Surface Science
出版狀態已發佈 - 1997 4月

ASJC Scopus subject areas

  • 化學 (全部)
  • 凝聚態物理學
  • 物理與天文學 (全部)
  • 表面和介面
  • 表面、塗料和薄膜


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