Effect of processing parameters on the nucleation behavior of nano-crystalline diamond film

Y. C. Lee, S. J. Lin, C. T. Chia, H. F. Cheng, I. N. Lin

研究成果: 雜誌貢獻文章同行評審

8 引文 斯高帕斯(Scopus)

摘要

The nucleation behavior of nanodiamond films and the associated electron field emission properties were investigated. Among the important CVD parameters, the methane/hydrogen ratio and the total pressure impose most markedly effect, whereas the microwave power and the boron content show least significant effect on the nucleation behavior for the nanodiamonds. Presumably, the prime factor modifying the rate of formation of diamond nuclei is the proportion of C +- and H+-species contained in the plasma. The bias voltage applied for nucleation of diamonds show more marked effect on improving the electron field emission capacity for the nanodiamonds than the boron-content does. It is ascribed to the increase in proportion of grain boundaries, as the grain boundaries are highly conductive and are good emission sites.

原文英語
頁(從 - 到)296-301
頁數6
期刊Diamond and Related Materials
14
發行號3-7
DOIs
出版狀態已發佈 - 2005 三月 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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