Effect of oxygen exposure on the magnetic properties of ultrathin Co/Si(1 1 1)-7×7 films

H. W. Chang*, J. S. Tsay, W. Y. Chang, K. T. Huang, Y. D. Yao

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

5 引文 斯高帕斯(Scopus)

摘要

Effect of oxygen exposure on the magnetic properties of ultrathin Co/Si(1 1 1)-7×7 films have been studied. In ultrahigh vacuum environment, Auger electron spectroscopy (AES) analysis shows that no oxygen adsorption occurs on Si(1 1 1)-7×7 surface and Co-Si compound interfaces. As the thickness of Co films increases above 5 monolayers (ML), pure cobalt islands form on the surface and the amount of oxygen on the surface layers increases with increasing the oxygen exposure time. From the results of slight chemical shift and depth profiling measurements, the oxygen is weakly adsorbed on the topmost layer of 15 ML Co/Si(1 1 1) films. The adsorbed oxygen influences the electronic density of states of Co and leads to the changes of the magnetic properties. The appearance of the O/Co interface could modify the stress anisotropy, as a result, the coercivity of ultrathin Co/Si(1 1 1) films are enhanced. As an example for 15 ML Co/Si(1 1 1), the coercivity increases from 140 to 360 Oe with 5000 Langmuir of oxygen exposure.

原文英語
頁(從 - 到)2398-2401
頁數4
期刊Journal of Magnetism and Magnetic Materials
321
發行號16
DOIs
出版狀態已發佈 - 2009 8月

ASJC Scopus subject areas

  • 電子、光磁材料
  • 凝聚態物理學

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