TY - JOUR
T1 - Effect of field power on growth of multiwall carbon nanotubes
AU - Ma, Yuan Ron
AU - Cheng, Kai Wen
AU - Shee, Cheng Hung
AU - Tsai, Chai Chang
AU - Cheng, Chia Liang
AU - Liu, Hsiang Lin
AU - Wong, Ming Shou
AU - Liou, Yung
AU - Yao, Yeong Der
N1 - Funding Information:
The authors would like to thank the National Science Council of the Republic of China for financially supporting this Research under Contract No. NSC 92-2112-M-259-013.
PY - 2004/11
Y1 - 2004/11
N2 - Hot-filament chemical vapor deposition (HFCVD), using a mixture of methane and hydrogen, is used to grow multiwall carbon nanotubes (MWNTs) on a nickel (Ni) plate. When electrical fields with various powers were applied between the tungsten (W) filaments and the surface of the Ni plate, alignment MWNTs formed along the direction of the electrical field, which was vertical to the surface of the Ni plate. This study revealed that the length of the alignment MWNT increased linearly with the field power, presenting the effect of field power on the growth of MWNT.
AB - Hot-filament chemical vapor deposition (HFCVD), using a mixture of methane and hydrogen, is used to grow multiwall carbon nanotubes (MWNTs) on a nickel (Ni) plate. When electrical fields with various powers were applied between the tungsten (W) filaments and the surface of the Ni plate, alignment MWNTs formed along the direction of the electrical field, which was vertical to the surface of the Ni plate. This study revealed that the length of the alignment MWNT increased linearly with the field power, presenting the effect of field power on the growth of MWNT.
KW - Effect of field power
KW - Hot-filament chemical vapor deposition
KW - Multiwall carbon nanotubes
KW - Vertical alignment
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U2 - 10.1016/j.jmmm.2004.04.014
DO - 10.1016/j.jmmm.2004.04.014
M3 - Conference article
AN - SCOPUS:5744236902
SN - 0304-8853
VL - 282
SP - 61
EP - 64
JO - Journal of Magnetism and Magnetic Materials
JF - Journal of Magnetism and Magnetic Materials
IS - 1-3
T2 - International Symposium on Advanced Magnetic Technologies
Y2 - 13 November 2003 through 16 November 2003
ER -