TY - JOUR
T1 - Diffusion and elementary atomic processes at steeped surfaces
AU - Tsong, Tien T.
AU - Fu, Tsu Yi
PY - 1996
Y1 - 1996
N2 - The mobility of atoms at and near lattice step edges plays an important role in epitaxial growth and surface morphology of thin films, and the dynamic behavior of surfaces at elevated temperature. We summarize our recent FIM studies on how atoms move and bind at step edges, how atoms can descend and ascend lattice steps, how in-layer atoms can move up to the upper terrace, and how these atomic processes are related to various growth structures in thin film epitaxy.
AB - The mobility of atoms at and near lattice step edges plays an important role in epitaxial growth and surface morphology of thin films, and the dynamic behavior of surfaces at elevated temperature. We summarize our recent FIM studies on how atoms move and bind at step edges, how atoms can descend and ascend lattice steps, how in-layer atoms can move up to the upper terrace, and how these atomic processes are related to various growth structures in thin film epitaxy.
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U2 - 10.1016/S0079-6816(96)00021-4
DO - 10.1016/S0079-6816(96)00021-4
M3 - Article
AN - SCOPUS:0030257139
SN - 0079-6816
VL - 53
SP - 233
EP - 239
JO - Progress in Surface Science
JF - Progress in Surface Science
IS - 2-4
ER -