Diffusion and elementary atomic processes at steeped surfaces

Tien T. Tsong*, Tsu Yi Fu

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

4 引文 斯高帕斯(Scopus)

摘要

The mobility of atoms at and near lattice step edges plays an important role in epitaxial growth and surface morphology of thin films, and the dynamic behavior of surfaces at elevated temperature. We summarize our recent FIM studies on how atoms move and bind at step edges, how atoms can descend and ascend lattice steps, how in-layer atoms can move up to the upper terrace, and how these atomic processes are related to various growth structures in thin film epitaxy.

原文英語
頁(從 - 到)233-239
頁數7
期刊Progress in Surface Science
53
發行號2-4
DOIs
出版狀態已發佈 - 1996
對外發佈

ASJC Scopus subject areas

  • 一般化學
  • 凝聚態物理學
  • 表面和介面
  • 表面、塗料和薄膜

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