Diffusion and elementary atomic processes at steeped surfaces

Tien T. Tsong, Tsu Yi Fu

研究成果: 雜誌貢獻文章

4 引文 斯高帕斯(Scopus)

摘要

The mobility of atoms at and near lattice step edges plays an important role in epitaxial growth and surface morphology of thin films, and the dynamic behavior of surfaces at elevated temperature. We summarize our recent FIM studies on how atoms move and bind at step edges, how atoms can descend and ascend lattice steps, how in-layer atoms can move up to the upper terrace, and how these atomic processes are related to various growth structures in thin film epitaxy.

原文英語
頁(從 - 到)233-239
頁數7
期刊Progress in Surface Science
53
發行號2-4
DOIs
出版狀態已發佈 - 1996 一月 1

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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