摘要
In fabricating a diffractive optical element the ratio of the etching depth between the (n - 1)th and the nth mask is usually 1(2). We found that the diffraction efficiency of a diffractive optical element can be improved by as much as 7.8% if the above ratio (1(2)) is not kept constant. For achieving this improvement the difference between the desired and the actual diffraction pattern is also used as an objective function for phase quantization.
原文 | 英語 |
---|---|
頁(從 - 到) | 5894-5897 |
頁數 | 4 |
期刊 | Applied Optics |
卷 | 40 |
發行號 | 32 |
DOIs | |
出版狀態 | 已發佈 - 2001 11月 10 |
對外發佈 | 是 |
ASJC Scopus subject areas
- 原子與分子物理與光學
- 工程(雜項)
- 電氣與電子工程