Diffractive optical element designed by use of an irregular etching-depth sequence

Chung J. Kuo, Hung C. Chien, Ni Y. Chang, Chia H. Yeh

研究成果: 雜誌貢獻期刊論文同行評審

4 引文 斯高帕斯(Scopus)

摘要

In fabricating a diffractive optical element the ratio of the etching depth between the (n - 1)th and the nth mask is usually 1(2). We found that the diffraction efficiency of a diffractive optical element can be improved by as much as 7.8% if the above ratio (1(2)) is not kept constant. For achieving this improvement the difference between the desired and the actual diffraction pattern is also used as an objective function for phase quantization.

原文英語
頁(從 - 到)5894-5897
頁數4
期刊Applied Optics
40
發行號32
DOIs
出版狀態已發佈 - 2001 十一月 10
對外發佈

ASJC Scopus subject areas

  • 原子與分子物理與光學
  • 工程(雜項)
  • 電氣與電子工程

指紋

深入研究「Diffractive optical element designed by use of an irregular etching-depth sequence」主題。共同形成了獨特的指紋。

引用此