Development of a novel micro w-EDM power source with a multiple Resistor-Capacitor (mRC) relaxation circuit for machining high-melting point, -hardness and -resistance materials

Shun Tong Chen*, Chi Hung Chen

*此作品的通信作者

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

21 引文 斯高帕斯（Scopus）

指紋

深入研究「Development of a novel micro w-EDM power source with a multiple Resistor-Capacitor (mRC) relaxation circuit for machining high-melting point, -hardness and -resistance materials」主題。共同形成了獨特的指紋。

Engineering

Physics

INIS

Material Science