Design of ESD Protection Device for K/Ka-Band Applications in Nanoscale CMOS Process

Chun Yu Lin, Rong Kun Chang

研究成果: 雜誌貢獻期刊論文同行評審

12 引文 斯高帕斯(Scopus)

指紋 深入研究「Design of ESD Protection Device for K/Ka-Band Applications in Nanoscale CMOS Process」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science