Damage-free photo-assisted cryogenic etching of GaN as evidenced by reduction of yellow luminescence

J. T. Hsieh*, J. M. Hwang, H. L. Hwang, W. H. Hung

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

2 引文 斯高帕斯(Scopus)

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深入研究「Damage-free photo-assisted cryogenic etching of GaN as evidenced by reduction of yellow luminescence」主題。共同形成了獨特的指紋。

Engineering

Material Science

Physics

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