Controlled growth of Co nanoparticle assembly on nanostructured template Al2O3/NiAl(100)

Wen Chin Lin, Shen Shing Wong, Po Chun Huang, Chii Bin Wu, Bin Rui Xu, Cheng Tien Chiang, Hong Yu Yen, Minn Tsong Lin

研究成果: 雜誌貢獻文章

14 引文 斯高帕斯(Scopus)

摘要

Based on the systematic studies of the growth temperature, deposition rate, and annealing effects, the control of Co nanoparticle density, size, and alignment is demonstrated to be feasible on a nanostructured template Al2 O3 NiAl (100). At 140-170 K, a slow deposition rate (0.027 MLmin) promises both the linear alignment and the high particle density. 1.5 ML Co nanoparticle assembly sustains the density of ∼260 104 nm2 even after 800-1090 K annealing. This study also indicates the possibilities of the controlled growth for nanoparticles of different materials.

原文英語
文章編號153111
期刊Applied Physics Letters
89
發行號15
DOIs
出版狀態已發佈 - 2006 十月 20

    指紋

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

引用此

Lin, W. C., Wong, S. S., Huang, P. C., Wu, C. B., Xu, B. R., Chiang, C. T., Yen, H. Y., & Lin, M. T. (2006). Controlled growth of Co nanoparticle assembly on nanostructured template Al2O3/NiAl(100). Applied Physics Letters, 89(15), [153111]. https://doi.org/10.1063/1.2358926