摘要
In this paper, a novel ballistic-injection AND-type (BiAND) split gate flash memory, with a trench select gate and buried n+ source is proposed. The ballistic source side injection (BSSI) programming mechanism is performed and realized in a contactless AND array, which features high programming efficiency, 10-3-10-4 and small cell size of 5F2. In addition, both the programming speed and read current is enhanced by the shared select gate structure. The BiAND flash memory is thus promising for low-voltage, high efficient, fast speed, scalable and high reliability non-volatile memory applications.
原文 | 英語 |
---|---|
頁(從 - 到) | 674-679 |
頁數 | 6 |
期刊 | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
卷 | 45 |
發行號 | 2 A |
DOIs | |
出版狀態 | 已發佈 - 2006 2月 8 |
對外發佈 | 是 |
ASJC Scopus subject areas
- 一般工程
- 一般物理與天文學